On the OLED lithography line, you can’t afford drift. Half a degree Celsius during the photoresist bake is enough to shift critical dimensions and scrap an entire mask level. You need a drying lamp that treats the thermal budget like a real process parameter, not an afterthought. What matters under the hood We built the OLED drying lamp around short-wave halogen emitters in quartz envelopes. It throws out fast-ramp NIR that gets into the photoresist without scorching the stack. Wafer-level uniformity stays within ±0.1°C across the bake zone, so soft bake and hard bake profiles actually track to the recipe. It’s cleanroom-compatible down to Class 1–100, thanks to a particle-controlled assembly and materials that don’t outgas. That keeps particle contribution from the lamp itself below process spec. And the system repeats setpoints, day in and day out, so your etch and development budgets don’t drift. Why this plays in OLED OLED stacks are thin and thermally sensitive. Overshoot during the photoresist bake gives you residue, adhesion headaches, and yield hits. This lamp heats quickly and under tight control, which shortens the thermal soak window. That translates to tighter CD control and fewer stochastic defects. You also get lower energy use, because the lamp hits setpoint fast and holds it with minimal oscillation. And it’s engineered to run 24/7, which means fewer unplanned stops and less rework when bake excursions happen. What you need to plan for The lamp needs a dedicated power bus and EMI-aware routing so it doesn’t step on the lithography tool’s sensors. Schedule a short commissioning run to map hot spots against your specific chuck and wafer stack, then lock the profile in the controller. Once it’s aligned, the system behaves like a repeatable thermal module, not just a heat source. That’s the whole point.